A 32-site neural recording probe fabricated by double-sided deep reactive ion etching of Silicon-on-Insulator substrates

Peter Norlin; Maria G. Kindlundh; W. Jensen; K. Yoshida; Aliette Mouroux; U. G. Hofmann

A 32-site neural recording probe fabricated by double-sided deep reactive ion etching of Silicon-on-Insulator substrates

Peter Norlin, Maria G. Kindlundh, W. Jensen, K. Yoshida, Aliette Mouroux, U. G. Hofmann

Institute of Signal Processing

Abstract

A neural probe with a 32-site electrode array was fabricated using an all-dry Si etch based micromachining process. The fork-like probe shafts were formed by double-sided deep reactive ion etching (DRIE) of a silicon-on-insulator (SOI) substrate, with the buried SiO2 layer acting as an etch stop. The shafts typically had the dimensions 5 mm x 25 μm x 20 μm and a tip taper of 4°. An array of Ir electrodes, each 100 μm, and Au conductor traces were formed by e-beam evaporation. SEM studies showed sharply defined probes and probe tips. The function was verified in bench-top measurements in saline. The magnitude of the electrode impedance was in the 1 MΩ-range @ 1 kHz, which is consistent with neural recordings.

Original language	English
Pages	1-4
Number of pages	4
Publication status	Published - 2001
Event	12th Micromechanics Europe Workshop - Cork, Ireland Duration: 16.09.2001 → 18.09.2001

Conference

Conference	12th Micromechanics Europe Workshop
Abbreviated title	MME 2001
Country/Territory	Ireland
City	Cork
Period	16.09.01 → 18.09.01

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title = "A 32-site neural recording probe fabricated by double-sided deep reactive ion etching of Silicon-on-Insulator substrates",

abstract = "A neural probe with a 32-site electrode array was fabricated using an all-dry Si etch based micromachining process. The fork-like probe shafts were formed by double-sided deep reactive ion etching (DRIE) of a silicon-on-insulator (SOI) substrate, with the buried SiO2 layer acting as an etch stop. The shafts typically had the dimensions 5 mm x 25 μm x 20 μm and a tip taper of 4°. An array of Ir electrodes, each 100 μm, and Au conductor traces were formed by e-beam evaporation. SEM studies showed sharply defined probes and probe tips. The function was verified in bench-top measurements in saline. The magnitude of the electrode impedance was in the 1 MΩ-range @ 1 kHz, which is consistent with neural recordings. ",

author = "Peter Norlin and Kindlundh, {Maria G.} and W. Jensen and K. Yoshida and Aliette Mouroux and Hofmann, {U. G.}",

year = "2001",

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note = "12th Micromechanics Europe Workshop <br/>, MME 2001 ; Conference date: 16-09-2001 Through 18-09-2001",

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T1 - A 32-site neural recording probe fabricated by double-sided deep reactive ion etching of Silicon-on-Insulator substrates

AU - Norlin, Peter

AU - Kindlundh, Maria G.

AU - Jensen, W.

AU - Yoshida, K.

AU - Mouroux, Aliette

AU - Hofmann, U. G.

PY - 2001

Y1 - 2001

N2 - A neural probe with a 32-site electrode array was fabricated using an all-dry Si etch based micromachining process. The fork-like probe shafts were formed by double-sided deep reactive ion etching (DRIE) of a silicon-on-insulator (SOI) substrate, with the buried SiO2 layer acting as an etch stop. The shafts typically had the dimensions 5 mm x 25 μm x 20 μm and a tip taper of 4°. An array of Ir electrodes, each 100 μm, and Au conductor traces were formed by e-beam evaporation. SEM studies showed sharply defined probes and probe tips. The function was verified in bench-top measurements in saline. The magnitude of the electrode impedance was in the 1 MΩ-range @ 1 kHz, which is consistent with neural recordings.

AB - A neural probe with a 32-site electrode array was fabricated using an all-dry Si etch based micromachining process. The fork-like probe shafts were formed by double-sided deep reactive ion etching (DRIE) of a silicon-on-insulator (SOI) substrate, with the buried SiO2 layer acting as an etch stop. The shafts typically had the dimensions 5 mm x 25 μm x 20 μm and a tip taper of 4°. An array of Ir electrodes, each 100 μm, and Au conductor traces were formed by e-beam evaporation. SEM studies showed sharply defined probes and probe tips. The function was verified in bench-top measurements in saline. The magnitude of the electrode impedance was in the 1 MΩ-range @ 1 kHz, which is consistent with neural recordings.

UR - https://www.semanticscholar.org/paper/A-32-site-Neural-Recording-Probe-Fabricated-by-Deep-Norlin-Kindlundh/362ff2b704901a882a8ebf8142af6cea1f55098b

M3 - Conference Papers

SP - 1

EP - 4

T2 - 12th Micromechanics Europe Workshop <br/>

Y2 - 16 September 2001 through 18 September 2001

ER -

A 32-site neural recording probe fabricated by double-sided deep reactive ion etching of Silicon-on-Insulator substrates

Abstract

Conference

UN SDGs

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