Gas temperature measurement in CH4/CO2 dielectric-barrier discharges by optical emission spectroscopy

Jorge Luque; Martin Kraus; Alexander Wokaun; Ken Haffner; Ulrich Kogelschatz; Baldur Eliasson

doi:10.1063/1.1560570

Gas temperature measurement in CH₄/CO₂ dielectric-barrier discharges by optical emission spectroscopy

Jorge Luque^*, Martin Kraus, Alexander Wokaun, Ken Haffner, Ulrich Kogelschatz, Baldur Eliasson

^*Korrespondierende/r Autor/-in für diese Arbeit

Medizinische Klinik I

34 Zitate (Scopus)

Abstract

Optical emission spectroscopy was used to study the gas temperature measurement in CH₄/CO₂ dielectric-barrier discharges. This method offers a simple and precise way to measure gas temperatures in the dielectric-barrier discharge. The low temperature rotational distribution correlated with changes in ambient conditions while the high rotational temperature component and the vibrational temperature reflect the excess of energy during the CH radical formation.

Originalsprache	Englisch
Zeitschrift	Journal of Applied Physics
Jahrgang	93
Ausgabenummer	8
Seiten (von - bis)	4432-4438
Seitenumfang	7
ISSN	0021-8979
DOIs	https://doi.org/10.1063/1.1560570
Publikationsstatus	Veröffentlicht - 15.04.2003

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10.1063/1.1560570

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@article{d60b68d696cf42ebabc4c9ddd4892d1a,

title = "Gas temperature measurement in CH4/CO2 dielectric-barrier discharges by optical emission spectroscopy",

abstract = "Optical emission spectroscopy was used to study the gas temperature measurement in CH4/CO2 dielectric-barrier discharges. This method offers a simple and precise way to measure gas temperatures in the dielectric-barrier discharge. The low temperature rotational distribution correlated with changes in ambient conditions while the high rotational temperature component and the vibrational temperature reflect the excess of energy during the CH radical formation.",

author = "Jorge Luque and Martin Kraus and Alexander Wokaun and Ken Haffner and Ulrich Kogelschatz and Baldur Eliasson",

year = "2003",

month = apr,

day = "15",

doi = "10.1063/1.1560570",

language = "English",

volume = "93",

pages = "4432--4438",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics",

number = "8",

}

TY - JOUR

T1 - Gas temperature measurement in CH4/CO2 dielectric-barrier discharges by optical emission spectroscopy

AU - Luque, Jorge

AU - Kraus, Martin

AU - Wokaun, Alexander

AU - Haffner, Ken

AU - Kogelschatz, Ulrich

AU - Eliasson, Baldur

PY - 2003/4/15

Y1 - 2003/4/15

N2 - Optical emission spectroscopy was used to study the gas temperature measurement in CH4/CO2 dielectric-barrier discharges. This method offers a simple and precise way to measure gas temperatures in the dielectric-barrier discharge. The low temperature rotational distribution correlated with changes in ambient conditions while the high rotational temperature component and the vibrational temperature reflect the excess of energy during the CH radical formation.

AB - Optical emission spectroscopy was used to study the gas temperature measurement in CH4/CO2 dielectric-barrier discharges. This method offers a simple and precise way to measure gas temperatures in the dielectric-barrier discharge. The low temperature rotational distribution correlated with changes in ambient conditions while the high rotational temperature component and the vibrational temperature reflect the excess of energy during the CH radical formation.

UR - https://www.scopus.com/pages/publications/0038680460

U2 - 10.1063/1.1560570

DO - 10.1063/1.1560570

M3 - Journal articles

AN - SCOPUS:0038680460

SN - 0021-8979

VL - 93

SP - 4432

EP - 4438

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 8

ER -