A 32-site neural recording probe fabricated by DRIE of SOI substrates

Engineering

• Deep Reactive Ion Etching 100%
• Silicon on Insulator 100%
• Micro Machining 50%
• Interconnects 50%
• Probe Tip 50%
• Sio2 Layer 50%
• Taper Angle 50%

Material Science

• Shaft 100%
• Reactive Ion Etching 100%
• Micromachining 33%
• Conductor 33%